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Depth-selective defect analysis of Si implanted with As+ under channeling conditions using a variable-energy positron beam

✍ Scribed by K. Hirata; Y. Kobayashi


Book ID
114169695
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
388 KB
Volume
136-138
Category
Article
ISSN
0168-583X

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