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Depth progression of dissociation reaction of the 1.014-eV photoluminescence copper center in copper-diffused silicon crystal measured by deep-level transient spectroscopy

โœ Scribed by Nakamura, Minoru; Murakami, Susumu


Book ID
120185671
Publisher
American Institute of Physics
Year
2011
Tongue
English
Weight
317 KB
Volume
98
Category
Article
ISSN
0003-6951

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