Depth profiling and diffusion of 22Ne implanted in tantalum by (p, γ) resonance broadening

Depth resolution in sputter depth profil

Depth resolution in sputter depth profiling-characterization of a third batch of tantalum pentoxide on tantalum certified reference material by AES and SIMS

✍ Seah, M. P.; Spencer, S. J.; Gilmore, I. S.; Johnstone, J. E. 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 318 KB 👁 2 views

Depth profiles have been made for a new batch of the certified reference material, BCR 261, of ~30 nm and 100 nm of anodic tantalum pentoxide layers on tantalum foil. Atomic force microscopy studies show that the preparation method traditionally used provides an excellent substrate root-mean-square