Depth profiles of implanted 18F, 79Br, and 132Xe in silicon in the energy range 85–600 keV

✍ Scribed by Chunyu Tan; Yueyuan Xia; Hong Yang; Xiufang Sun; Jiarui Liu; Zongshuang Zheng; Peiran Zhu

• Book ID: 113279491
• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 605 KB
• Volume: 42
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(89)90002-5