Depth profile analysis of chemically amplified resist by using TOF-SIMS with gradient shaving preparations

✍ Scribed by N. Man; H. Okumura; H. Oizumi; N. Nagai; H. Seki; I. Nishiyama

• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 131 KB
• Volume: 231-232
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2004.03.093