Depth-profile analysis from X-ray photoelectron spectroscopy on As-implanted ZnO activated in ozone ambient
✍ Scribed by T. S. Jeong; J. H. Kim; S. J. Bae; C. J. Youn
- Book ID
- 102122789
- Publisher
- John Wiley and Sons
- Year
- 2008
- Tongue
- English
- Weight
- 328 KB
- Volume
- 43
- Category
- Article
- ISSN
- 0232-1300
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✦ Synopsis
Chemical bonds of As-implanted ZnO annealed in ozone molecular (O 3 ) ambient were analyzed through the x-ray photoelectron spectroscopy as a function of the etching depth. With the etching depth increased to 25 nm from surface, the peaks of Zn2p and O1s core levels shifted toward the low-binding energy, and the bonding formation of As 3d core level gradually varied from As 2 O 5 to As 2 O 3 . The new peaks were observed, which were posited to high-binding energy of 4.4 eV from Zn2p and O1s core levels. Finally, the chemical bonds of As-based oxides were found to consist of Zn(AsO 3 ) 2 , As 2 O 5 , and As 2 O 3 .