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Deposition profile of Ti film inside a trench and its correlation with gas-phase ionization in high-pressure magnetron sputtering

✍ Scribed by Nafarizal, N.; Takada, N.; Nakamura, K.; Sago, Y.; Sasaki, K.


Book ID
118059811
Publisher
AVS (American Vacuum Society)
Year
2006
Tongue
English
Weight
493 KB
Volume
24
Category
Article
ISSN
0734-2101

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