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Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure—A Comparison

✍ Scribed by A. Sonnenfeld; T. M. Tun; L. Zajíčková; K. V. Kozlov; H.-E. Wagner; J. F. Behnke; R. Hippler

Book ID: 110328687
Publisher: Springer
Year: 2001
Tongue: English
Weight: 431 KB
Volume: 6
Category: Article
ISSN: 1084-0184
DOI: 10.1023/a:1014414016164

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