Properties of chemical vapour deposited
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P.S. Shinde; C.H. Bhosale
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Article
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2008
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Elsevier Science
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English
⚖ 815 KB
Nanocrystalline titanium dioxide (TiO 2 ) thin films have been prepared using titanium(IV) isopropoxide as a precursor onto the glass and fluorine doped tin oxide coated glass substrates by chemical vapour deposition technique at 400 8C substrate temperature. X-ray diffraction study confirms the pol