✦ LIBER ✦

Deposition of Ti–Al–N coatings by thermal CVD

✍ Scribed by J. Wagner; V. Edlmayr; M. Penoy; C. Michotte; C. Mitterer; M. Kathrein

Book ID: 113656389
Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 441 KB
Volume: 26
Category: Article
ISSN: 0263-4368
DOI: 10.1016/j.ijrmhm.2008.01.003

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Deposition of (Ti,Al)N coatings on plasm

Deposition of (Ti,Al)N coatings on plasma nitrided steel

✍ Miodrag Zlatanović 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 757 KB

(Ti,Al)/(Ti,Al)N coatings produced by la

(Ti,Al)/(Ti,Al)N coatings produced by laser surface alloying

✍ I Garcı́a; J de la Fuente; J.J de Damborenea 📂 Article 📅 2002 🏛 Elsevier Science 🌐 English ⚖ 467 KB

Stress measurements in thermal loaded (T

Stress measurements in thermal loaded (Ti,Al)N hard coatings

✍ Th. Göbel; S. Menzel; M. Hecker; W. Brückner; K. Wetzig; Ch. Genzel 📂 Article 📅 2001 🏛 Elsevier Science 🌐 English ⚖ 312 KB

Properties of (Ti,Al)N coatings deposite

Properties of (Ti,Al)N coatings deposited by the magnetic filter cathodic arc

✍ Ming-Sheng Leu; B.F Chen; S.Y Chen; Y.W Lee; W.C Lih 📂 Article 📅 2000 🏛 Elsevier Science 🌐 English ⚖ 197 KB

Elaboration and Properties of CVD Ti-N-S

Elaboration and Properties of CVD Ti-N-Si Coatings

✍ Georges Llauro; Roger Hillel; François Sibieude 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 271 KB 👁 2 views

Silicon alloying of TiN has been performed by CVD from TiCl 4 -SiH 2 Cl 2 -NH 3 or N 2 -H 2 at temperatures between 850 °C and 1100 °C. With ammonia, only triphased coatings have been deposited, corresponding to TiSi 2 -Ti 5 Si 3 (N)-TiN and TiSi 2 -a Si 3 N 4 -TiN mixtures. With nitrogen, the incor

Ti–Al–Si–N films for superhard coatings

Ti–Al–Si–N films for superhard coatings deposited by reactive cosputtering using Ti, Al, and Si targets

✍ A. Miyamura; M. Yamaguchi; K. Hattori; Y. Sato; S. Nakamura; Y. Shigesato 📂 Article 📅 2007 🏛 AVS (American Vacuum Society) 🌐 English ⚖ 665 KB