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Deposition of thin films using an isotope separator

✍ Scribed by R.P.W. Lawson; J.H. Freeman; J.S. Colligon; W.A. Grant; M.J. Nobes; J.S. Williams

Publisher
Elsevier Science
Year
1975
Weight
112 KB
Volume
131
Category
Article
ISSN
0029-554X

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An ion beam deposition system to produce isotopically pure epitaxial thin films of different materials has been designed and built. Using negative ions, problems due to mass interference with molecular ions could be significantly reduced, thus allowing the production, for instance, of 29 Si films of