✦ LIBER ✦
Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface micromachining applications
✍ Scribed by M. Kirsten; B. Wenk; F. Ericson; J.Å. Schweitz; W. Riethmüller; P. Lange
- Book ID
- 103425024
- Publisher
- Elsevier Science
- Year
- 1995
- Tongue
- English
- Weight
- 751 KB
- Volume
- 259
- Category
- Article
- ISSN
- 0040-6090
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