## Abstract We report on the fabrication of germanium quantum dots on silicon oxide and their growth mechanism. Germanium quantum dots were deposited by inductively‐coupled plasma CVD at 400 °C. Gold nanoparticles, attached to silicon oxide through a self‐assembled monolayer, were adopted as cataly
✦ LIBER ✦
Deposition of silicon oxide hard coatings by low-temperature radio-frequency plasmas
✍ Scribed by Chun Huang; Qingsong Yu
- Publisher
- John Wiley and Sons
- Year
- 2010
- Tongue
- English
- Weight
- 597 KB
- Volume
- 116
- Category
- Article
- ISSN
- 0021-8995
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Poly(tetrafluoroethylene) (PTFE) films were treated with a low-temperature cascade arc torch (LTCAT) and radio-frequency (RF) plasmas of argon and hydrogen. The plasma-treatment effect on the PTFE surface was studied with contact-angle measurement and scanning electron spectroscopy (SEM). LTCAT argo