✦ LIBER ✦
Deposition of silicon dioxide films by the reaction of SiCl4 or SiHCl3 with water vapour : Yuichi Haneta and Sho Nakanuma, NEC Res. Dev.9, April (1967), p. 67
- Publisher
- Elsevier Science
- Year
- 1968
- Tongue
- English
- Weight
- 99 KB
- Volume
- 7
- Category
- Article
- ISSN
- 0026-2714
No coin nor oath required. For personal study only.