## Abstract Atmospheric pressure chemical vapor deposition (APCVD) of niobium sulfide coatings was achieved on glass substrates from the reaction of NbCl~5~ and S(SiMe~3~)~2~, __t__Bu~2~S~2~, __t__BuSH, or HSCH~2~CH~2~SH at 250β600 Β°C. The niobium sulfide films grown at temperatures above 500 Β°C we
β¦ LIBER β¦
Deposition of niobium silicide thin films from hexachlorodisilane and niobium pentachloride
β Scribed by W. S. Cheng; C. Y. Lee
- Book ID
- 104678734
- Publisher
- Springer
- Year
- 1994
- Tongue
- English
- Weight
- 346 KB
- Volume
- 13
- Category
- Article
- ISSN
- 0261-8028
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