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Deposition of nanocrystalline CuS thin film from a single precursor: Structural, optical and electrical properties

✍ Scribed by Swarup Kumar Maji; Nillohit Mukherjee; Amit Kumar Dutta; Divesh N. Srivastava; Parimal Paul; Basudeb Karmakar; Anup Mondal; Bibhutosh Adhikary

Book ID
113784314
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
870 KB
Volume
130
Category
Article
ISSN
0254-0584

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## Abstract Glancing‐angle deposition (GLAD) was used in this work to grow transparent oxide Cu~2~O thin films by annealing in air at 185 °C of copper films deposited firstly by this method onto glass substrates. The annealing temperature of 185 °C corresponds to the optimal temperature that corres