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Deposition of Me-C: H coatings from metal organic precursors using a plasma-activated r.f. process

✍ Scribed by C. Benndorf; J.T. Harnack; U. Fell


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
542 KB
Volume
59
Category
Article
ISSN
0257-8972

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