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Deposition of hydrogenated amorphous carbon nitride films by dielectric barrier discharge plasmas

โœ Scribed by Jinhai Niu; Lianlian Zhang; Zhihui Zhang; Dongping Liu; Yanhong Liu; Zhiqing Feng

Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
828 KB
Volume
256
Category
Article
ISSN
0169-4332

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Optical properties of plasma deposited amorphous carbon nitride films on polymer substrates
โœ S.H. Mohamed; F.M. El-Hossary; G.A. Gamal; M.M. Kahlid ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 299 KB

Amorphous carbon nitride thin films were deposited on polymer substrates using radio frequency (rf) plasma in a mixture of nitrogen (N 2 ) and acetylene (C 2 H 2 ) gasses. The samples were prepared at different rf plasma power (350, 400, 450, 500, and 550 W), at constant plasma exposure time of 10 m