Deposition and heat treatment of CuAlNi shape memory thin films

✍ Scribed by X. Wu; K. Kutschej; A. C. Kneissl

• Book ID: 102945652
• Publisher: John Wiley and Sons
• Year: 2003
• Tongue: English
• Weight: 693 KB
• Volume: 34
• Category: Article
• ISSN: 0933-5137
• DOI: 10.1002/mawe.200390097

✦ Synopsis

Abstract

CuAlNi thin films were fabricated by magnetron sputtering process. After heat treatment, the thin films presented a shape memory effect. Calowear method was used to measure the thickness of the thin films. SEM, XRD and TEM were used to characterize the thin films. The phase transformation in the thin films was examined by DSC. The deposition rate increased with increasing sputtering power and decreased with increasing Ar pressure. Compared to the composition of the target, both the content of Al and the content of Ni increased a little. The sputtering conditions had little influence on the content of Ni. The content of Al varied slightly with sputtering power, while decreased with increasing Ar pressure. The deposited thin films were columnar. The grain size was very fine. The phases were α‐Cu and α~2~. After heat treatment at 800 ^o^C/ 60 min + 300 ^o^C/ 60 min in vacuum, CuAlNi shape memory thin films were obtained. The phase in the heat‐treated thin films was β~1~’ martensite. Martensite transformation was observed and a two‐way shape memory effect could be shown.