๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Dependence of the ion sputtering rate on the light-induced change in the work function of heterophase semiconductors

โœ Scribed by A. G. Rokakh; S. V. Stetsyura; A. G. Zhukov; A. A. Serdobintsev


Book ID
111449296
Publisher
SP MAIK Nauka/Interperiodica
Year
2006
Tongue
English
Weight
174 KB
Volume
32
Category
Article
ISSN
1063-7850

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Investigation of the drastic change in t
โœ J. Zekonyte; V. Zaporojtchenko; F. Faupel ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 172 KB

The polymer sputter rate dependence on ion fluence and ion chemistry (Ar, N 2 , O 2 ) at 1 keV energy was investigated using a quartz crystal microbalance (QCM) which allowed to do real time etch rate measurements and to study kinetics of sputtering. The obtained sputter rates differed drastically f