✦ LIBER ✦
Dependence of the chemical etch rate and etch time of silicon on the post-implanted diffusion depth: application for membrane achievement
✍ Scribed by F. Gaiseanu; C. Cobianu; D. Dascalu
- Book ID
- 104848925
- Publisher
- Springer
- Year
- 1993
- Tongue
- English
- Weight
- 116 KB
- Volume
- 12
- Category
- Article
- ISSN
- 0261-8028
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