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Dependence of Cell Distance and Well-Contact Density on MCU Rates by Device Simulations and Neutron Experiments in a 65-nm Bulk Process
✍ Scribed by Zhangd, Kuiyuan; Furuta, Jun; Kobayashi, Kazutoshi; Onodera, Hidetoshi
- Book ID
- 125900034
- Publisher
- IEEE
- Year
- 2014
- Tongue
- English
- Weight
- 890 KB
- Volume
- 61
- Category
- Article
- ISSN
- 0018-9499
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