A model of self-limiting residual acid d
β
JΓΌrgen Fuhrmann; AndrΓ© Fiebach; Manfred Uhle; Andreas Erdmann; Charles R. Szmand
π
Article
π
2009
π
Elsevier Science
π
English
β 537 KB
Pattern doubling by cross-linking of a spacer triggered by residual acid diffusion from a previously developed primary structure into the spacer is a possible option to create the necessary structure widths for the 32 nm node with current exposure technology by pattern doubling. A particular advanta