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Delay line using thick film ferromagnetic material : K. Kurzweil and R. Chikli-Pariente. Proc IEEE 1974 24th Electron. Compon. Conf. Washington, D.C. 13–15 May 148 (1974)

Publisher: Elsevier Science
Year: 1974
Tongue: English
Weight: 130 KB
Volume: 13
Category: Article
ISSN: 0026-2714
DOI: 10.1016/0026-2714(74)90421-1

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