Degradation of Ta 2 O 5 Gate Dielectric by TiCl 4 -Based Chemically Vapor Deposited TiN Film in W/TiN/Ta 2 O 5 /Si System

✍ Scribed by Lee, JooWan; Han, Chang Hee; Park, Ji-Soo; Park, Jin Won

• Book ID: 124049897
• Publisher: Institute of Pure and Applied Physics
• Year: 2001
• Tongue: English
• Weight: 175 KB
• Volume: 40
• Category: Article
• ISSN: 0021-4922
• DOI: 10.1143/JJAP.40.2810