Degradation of organoarsenic compounds by a hydrothermal or photo-oxidation process
✍ Scribed by Shigeru Maeda; Akira Ohki; Takanori Kawabata; Mayumi Kishita
- Publisher
- John Wiley and Sons
- Year
- 1999
- Tongue
- English
- Weight
- 96 KB
- Volume
- 13
- Category
- Article
- ISSN
- 0268-2605
No coin nor oath required. For personal study only.
✦ Synopsis
The degradation of organoarsenic compounds by a hydrothermal process and by photooxidation was studied. When 4-aminophenylarsonic acid (4-APA) was treated hydrothermally, almost complete degradation into an inorganic arsenic compound (arsenate, IA) was attained by use of 1.0-3.0 M NaOH solution at 200 °C. Phenylarsonic acid derivatives which had nitro or hydroxy substituents on the phenyl ring were rather more efficiently degraded than those with amino-substituents. Compared with phenylarsonic acid derivatives with those functional groups, phenylarsonic acid (PA) and dimethylarsinic acid (DMA) were hard to degrade. On the other hand, DMA was effectively degraded into IA by TiO 2 -catalyzed photo-oxidation, whereas for PA and 4-APA the photo-oxidation treatment was not efficient.