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Defects in high-dose oxygen implanted silicon: a TEM study : A. De Veirman and J. Van Landuyt, J. Vanhellemont, H. E. Maes and K. Yallup. Vacuum42(5/6), 367 (1991)


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
90 KB
Volume
31
Category
Article
ISSN
0026-2714

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