Defects developed in Ni-coatings deposited by the impulse plasma on metal substrates

✍ Scribed by K Zdunek

• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 423 KB
• Volume: 47
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(96)00216-3

✦ Synopsis

In impulse plasma deposition (IPDI, the only source of mass and energy is the coaxial impulse plasma accelerator and the quality of the IPD coatings depends strong/y on the parameters of the deposition process. Certain parameters have been studied to determine their relation to the morphological defects observed in IPD nickel coatings deposited on a range of metal substrates (Ni, Fe, Ti, Cu and Mol. It seems that for IPD the growth mechanism differs from that occurring in stationary PVD techniques so that the number and type of defects depend more on the process parameters than on the thermo-mechanical

properties of the pair of the coating/substrate materials.