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Defect Evolution in Block Copolymer Thin Films via Temporal Phase Transitions

✍ Scribed by Tsarkova, Larisa; Horvat, Andriana; Krausch, Georg; Zvelindovsky, Andrei V.; Sevink, G. J. Agur; Magerle, Robert

Book ID
115442134
Publisher
American Chemical Society
Year
2006
Tongue
English
Weight
1003 KB
Volume
22
Category
Article
ISSN
0743-7463

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## Abstract In recent years, there has been increased interest in using microphase‐separated block copolymer thin films as submicrometer/suboptical masks in next generation semiconductor and magnetic media fabrication. With the goals of removing metastable defects in block copolymer thin film simul