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Decomposition of CH 3 SH in a RF Plasma Reactor: Reaction Products and Mechanisms

โœ Scribed by Tsai, Cheng-Hsien; Lee, Wen-Jhy; Chen, Chuh-Yung; Liao, Wei-Tung


Book ID
126439567
Publisher
American Chemical Society
Year
2001
Tongue
English
Weight
236 KB
Volume
40
Category
Article
ISSN
0888-5885

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โœ N. R. Jensen; J. Hjorth; C. Lohse; H. Skov; G. Restelll ๐Ÿ“‚ Article ๐Ÿ“… 1992 ๐Ÿ› Springer Netherlands ๐ŸŒ English โš– 726 KB

Products and mechanisms of the reaction between the nitrate radical (NO3) and three of the most abundant reduced organic sulphur compounds in ~he atmosphere (CH3SCH3, CHsSH and CH3SSCH3), have been studied in a 480 L reaction chamber using in situ FT-IR and ion chromatography as analytical technique