𝔖 Bobbio Scriptorium
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DC plasma etching of silicon by sulfur hexafluoride. Mass spectrometric study of the discharge products

✍ Scribed by John J. Wagner; Werner W. Brandt


Book ID
104812326
Publisher
Springer
Year
1981
Tongue
English
Weight
604 KB
Volume
1
Category
Article
ISSN
0272-4324

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