✦ LIBER ✦
Damage, defects and diffusion from ultra-low energy (0–5 keV) ion implantation of silicon
✍ Scribed by Aditya Agarwal; H.-J Gossmann; D.J Eaglesham; L Pelaz; S.B Herner; D.C Jacobson; T.E Haynes; R Simonton
- Publisher
- Elsevier Science
- Year
- 1998
- Tongue
- English
- Weight
- 451 KB
- Volume
- 1
- Category
- Article
- ISSN
- 1369-8001
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