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Cyclic polymers. Edited by J. A. SEMLYEN. ISBN 0-85334-388-8. London/New York: Elsevier Applied Science Publishers 1986. X, 394 pp, £ 52.00

✍ Scribed by K. Dietrich


Publisher
John Wiley and Sons
Year
1988
Tongue
English
Weight
306 KB
Volume
39
Category
Article
ISSN
0323-7648

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✦ Synopsis


The 3rd mnual meeting of the SPIE dealing with resist materials and processing was held again in Santa Clara/CA in the United States. In 3 lecture sessions and additionally in a poster presentation 44 papers (21 oral communications) wcrc offered. The reports were delivered by representatives of leading laboratories in the USA and Japan.

Yolymcr Chemistry, combined with photo-and radiation chemistrj-are acting as the pacemakers in resist development. Accordingly, new sensitive resist polymers, capable of high resolution efficiency, have been synthesized and evaluated. Worth mentioning are e.g.:


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