𝔖 Bobbio Scriptorium
✦   LIBER   ✦

CW laser annealing of boron and arsenic-implanted silicon; electrical properties, crystalline structure and limitations: A. Gat, T. J. Magee, J. Peng, V. R. Deline and C. A. Evans, Jr.Solid-St. Technol. p. 59 (November 1979)


Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
72 KB
Volume
20
Category
Article
ISSN
0026-2714

No coin nor oath required. For personal study only.