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Crystallization kinetics of boron- and germanium-implanted 〈100〉 Si: a balance between doping and strain effects

✍ Scribed by F. Corni; R. Tonini; G. Ottaviani; M. Servidori; F. Priolo


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
306 KB
Volume
222
Category
Article
ISSN
0040-6090

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