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Crystallization and ablation in annealing of amorphous-Si thin film on glass and crystalline-Si substrates irradiated by third harmonics of Nd3+:YAG laser

✍ Scribed by I.A. Palani; Nilesh J. Vasa; M. Singaperumal


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
750 KB
Volume
11
Category
Article
ISSN
1369-8001

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