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Crystallinity of the mixed phase silicon thin films by Raman spectroscopy

✍ Scribed by M. Ledinský; A. Vetushka; J. Stuchlík; T. Mates; A. Fejfar; J. Kočka; J. Štěpánek

Book ID
116670919
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
164 KB
Volume
354
Category
Article
ISSN
0022-3093

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## Abstract Thin‐film silicon deposited by plasma‐enhanced chemical vapour deposition (PECVD), encompasses both hydrogenated amorphous silicon (a‐Si:H) and ‘nanocrystalline silicon’ (nc‐Si), the latter being a two‐phase mixture of discrete nanocrystallites in an amorphous matrix. It is distinguishe