Crystal growth of epitaxially grown PbTiO3 thin films on miscut SrTiO3 substrate

✍ Scribed by K Wasa; Y Haneda; T Sato; H Adachi; K Setsune

• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 439 KB
• Volume: 51
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(98)00252-8

✦ Synopsis

Thin films of (001)PbTiO 3 (PT), 5^260 nm thickness, were grown by sputtering on miscut (001)SrTiO 3 (ST) substrate with miscut angle of 1.78 at 6008C. Although the sputtered PT thin films were deformed by the two dimensional compressive force due to the small lattice of ST substrate and showed large tetragonality of c/a = 1.1 at RT, i.e. c/a = 1.06 for bulk PT, the PT thin films showed a single domain^single crystal perovskite structure through a large area with extremely smooth surface on an atomic scale. The film growth was governed by a step-flow model showing a layer growth. It was found that the layer growth was stable at low oxygen partial pressure during the sputtering deposition.