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Creating Defined 3-D Defects Inside an Opaline Ormocer® Matrix with Two-Photon Lithography

✍ Scribed by Birger Lange; Shalin J. Jhaveri; Lorenz Steidl; Ramakrishnan Ayothi; Christopher K. Ober; Rudolf Zentel


Book ID
102494502
Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
248 KB
Volume
28
Category
Article
ISSN
1022-1336

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✦ Synopsis


Abstract

The creation of defined structures inside a synthetic opal is a key step toward applications in optics, where control of the propagation of light inside a photonic crystal is necessary. In a previous paper, we described the nanostructuring of Ormocer® to form inverse opals (Lange et al., Macromol. Rapid Commun. 2006, 27, 1746). Here, we report an application for this robust replica process in which defects can be directly produced within the PC by two‐photon lithography. The holes of an inverse opal structure are first filled with a resin of similar refractive index. In this transparent material, polymerization can be initiated at defined places via two‐photon lithography. After removal of the unpolymerized resin, buried fluorescent defects of dimensions comparable to the repeating units of the replica are found. The wavelength of their emission can be adjusted to the band gap of the replica.

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