Coverage-dependent Bond Length of Chlorine Adsorbed on Cu{111}

✍ Scribed by Way, W. K.; Pike, A. C.; Rosencrance, S. W.; Braun, R. M.; Winograd, N.

• Publisher: John Wiley and Sons
• Year: 1996
• Tongue: English
• Weight: 515 KB
• Volume: 24
• Category: Article
• ISSN: 0142-2421
• DOI: 10.1002/(sici)1096-9918(199602)24:2<137::aid-sia72>3.0.co;2-1

✦ Synopsis

The adsorption of CI, on Cu{lll} at 300 K has been studied using shadow-cone-enhanced secondary ion mass spectrometry (SIMS). The system has been investigated for chlorine coverages ranging from 0.08 to 0.33 monolayer (ML), including the Cu{lll}-(J3 x J3)R3O0-CI surface. The secondary Cu* ion intensity has been measured as a function of the incidence angle of the primary ion beam. The enhanced intensity features in the spectra are compared with results from a two-body interaction calculation that uses the Moliere approximation to the ThomasFermi potential. A chlorine-copper interlayer spacing of 1.87 f 0.04 is measured between the coverages of 0.17 and 0.33 ML. This value corresponds to a chlorinoe-copper bond length of 2.38 f 0.04 A. At 0.08 ML, the chlorine-copper bond length is expanded to 2.48 f 0.04 A. These results suggest that the chlorine-copper bond is more ionic in the low coverage limit.