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Corrosion behavior of copper thin films deposited by EB-PVD technique on thermally grown silicon dioxide and glass in hydrochloric acid media

✍ Scribed by M. Saremi; M. Yeganeh


Book ID
113783643
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
631 KB
Volume
123
Category
Article
ISSN
0254-0584

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