The kinetics of the layer formation process and the corrosion process have been determined from the relation between the stationary (i,J and non-stationary (i,) corrosion rates and the rate of layer formation (it) at passive iron in acid solutions. The rates of both processes depend on the poten- ti
Corrosion and layer formation of passive copper in alkaline solutions
โ Scribed by Prof. Dr. H.-H. Strehblow; H.-D. Speckmann
- Publisher
- John Wiley and Sons
- Year
- 1984
- Tongue
- German
- Weight
- 515 KB
- Volume
- 35
- Category
- Article
- ISSN
- 0947-5117
No coin nor oath required. For personal study only.
โฆ Synopsis
Copper forms passivating layers in alkaline solutions. Depending on the electrode potential a Cu,O or a Cu20/Cu0, layer is present. The structure and composition of the film has been examined by different methods like X-ray Photoelectron Spectroscopy ( X P S ) , Ion Scattering Spectroscopy (ISS) and in situ Photoacoustic Spectroscopy (PAS). The thickness and growth of the passive layer has been determined by its electrochemical reduction i. e. the charges of potentiodynamic reduction peaks or the evaluation of the corresponding galvanostatic steps. The results support a high field mechanism for the oxide formation with an inverse logarithmic rate law and a linear increase of the oxide thickness with the electrode potential. The capacity of a Cu,O-layer refers to the characteristics of a thin semiconducting film. Studies with a rotating Pt split ring Cu disc electrode permit the subdivision of the current density into a part of layer formation and corrosion. The efficiency for the corrosion part is very small during the beginning of oxide formation and achieves q = 90% after some few minutes. In the potential range of CuzO formation only q = 50% is achieved.
Kupfer bildet passivierende Schichten in alkalischen Losungen. In Abhangigkeit vom Elektrodenpotential liegt eine CuzO oder eine Cu20/Cu0, Cu(OH),Schicht vor. Die Struktur und Zusammensetzung der Schicht wurde mit verschiedenen Methoden untersucht wie Rontgenphotoelektronenspektroskopie (XPS), Ionenriickstreuung ( I S ) und in situ photoakustischer Spektroskopie (PAS). Die Dicke und das Wachsen der Passivschicht wurde durch ihre elektrochemische Reduktion bestimmt, d. h. durch die Ladungen der potentiodynamischen Reduktionspeaks oder die Auswertung entsprechender Potentialstufen galvanostatischer Versuche. Die Ergebnisse stutzen einen Hochfeldmechanismus fur die Oxidbildung mit einem invers logarithmischen Zeitgesetz und einem linearen Anwachsen der Oxiddicke mit dem Elektrodenpotential. Die Kapazitat der CuzO-Schicht entspricht der Vorstellung eines dunnen halbleitenden Films. Untersuchungen mit einer rotierenden Pt-Ring-Cu-Scheiben-Elektrode mit gespaltenem Ring ermoglicht die Auftrennung der Gesamtstromdichte in einen Schichtbildungs-und Korrosionsteil. Die Ausbeute fiir die Korrosion ist sehr klein fur den ersten Moment der Schichtbildung und steigt in wenigen Minuten auf q = 90%. Im Potentialbereich der Cu20-Bildung wird nur q = 50% erreicht.
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