Corrigendum to “The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD” [Appl. Surf. Sci. 257 (2011) 3776–3779]

✍ Scribed by Doyoung Kim; Hyemin Kang; Jae-Min Kim; Hyungjun Kim

• Publisher: Elsevier Science
• Year: 2011
• Tongue: English
• Weight: 71 KB
• Volume: 257
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2011.04.059