Correlation of the Pit Depth in Crystal Etching by Dissolution
โ Scribed by Faruk Civan
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 51 KB
- Volume
- 222
- Category
- Article
- ISSN
- 0021-9797
No coin nor oath required. For personal study only.
โฆ Synopsis
NOTE Correlation of the Pit Depth in Crystal Etching by Dissolution A theoretically rigorous formulation relating the pit depth to dissolution time for crystal etching is presented and verified. The data of K. Dunn, E. Daniel, P. J. Shuler, H. J. Chen, Y. Tang, and T. F. Yen [J. Colloid Interface Sci. 214, 427 (1999)] for surface dissolution of barite are analyzed and correlated accurately. It is shown that the empirically determined power law pit growth function of F. Hunkeler and H. Bohni [Corrosion, 37(11), 645 (1981)] conforms to a special solution of the present formulation and their empirically determined power law exponent of 1/2 is theoretically justified. In addition, the present study provides some insight into the mechanism of the crystal dissolution rate process and the variation of pit depth during dissolution-induced etching.
๐ SIMILAR VOLUMES
Poorly soluble crystals of tolbutamide were modified in the presence of a soluble polymer or surfactant by the spherical crystallization technique, the objective being to improve the dissolution rate and to transform platelet crystals into spherical agglomerates. An HCI solution was added to a tolbu