Correlation between oxidation resistance and crystallinity of Ti–Al as a barrier layer for high-density memories

✍ Scribed by S Aggarwal; B Nagaraj; I.G Jenkins; H Li; R.P Sharma; L Salamanca-Riba; R Ramesh; A.M Dhote; A.R Krauss; O Auciello

• Publisher: Elsevier Science
• Year: 2000
• Tongue: English
• Weight: 376 KB
• Volume: 48
• Category: Article
• ISSN: 1359-6454
• DOI: 10.1016/s1359-6454(00)00148-8