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Controlling plasma charge damage in advanced semiconductor manufacturing. Challenge of small feature size device, large chip size, and large wafer size

✍ Scribed by Aum, P.K.; Brandshaft, R.; Brandshaft, D.; Dao, T.B.


Book ID
114537215
Publisher
IEEE
Year
1998
Tongue
English
Weight
723 KB
Volume
45
Category
Article
ISSN
0018-9383

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