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Controlling boron diffusion during rapid thermal annealing with co-implantation by amphoteric impurity atoms

โœ Scribed by Makarevich, Yu. V.; Komarov, F. F.; Komarov, A. F.; Mironov, A. M.; Zayats, G. M.; Miskevich, S. A.


Book ID
115065024
Publisher
Allerton Press Inc
Year
2012
Tongue
English
Weight
269 KB
Volume
76
Category
Article
ISSN
1062-8738

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