✦ LIBER ✦
Controlled shallow single-ion implantation in silicon using an active substrate for sub-20-keV ions
✍ Scribed by Jamieson, D. N.; Yang, C.; Hopf, T.; Hearne, S. M.; Pakes, C. I.; Prawer, S.; Mitic, M.; Gauja, E.; Andresen, S. E.; Hudson, F. E.; Dzurak, A. S.; Clark, R. G.
- Book ID
- 117995797
- Publisher
- American Institute of Physics
- Year
- 2005
- Tongue
- English
- Weight
- 556 KB
- Volume
- 86
- Category
- Article
- ISSN
- 0003-6951
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