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Control of duty ratio in waveguide gratings using a near-field holographic lithography system with a variable aperture

✍ Scribed by Jun-Ho Sung; Jeong-Su Yang; Bo-Soon Kim; Chul-Hyun Choi; Min-Woo Lee; Seung-Gol Lee; Se-Geun Park; El-Hang Lee; Beom-Hoan O


Book ID
118486076
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
632 KB
Volume
85
Category
Article
ISSN
0167-9317

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