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Control of bonded-hydrogen in plasma-deposited silicon nitrides: Combined plasma-assisted deposition and rapid thermal annealing for the formation of device-quality nitride layers for applications in multilayer dielectrics

✍ Scribed by Z. Lu; S.S. He; Y. Ma; G. Lucovsky


Book ID
115990383
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
424 KB
Volume
187
Category
Article
ISSN
0022-3093

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